Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
Affiliation of Author(s):
国家胶体材料工程技术研究中心
Journal:
polymers
First Author:
刘俊俊
Document Code:
DCE1A78A48074FA5A119FBCBE5F756DE
Volume:
16
Issue:
6
Number of Words:
8000
Translation or Not:
no
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