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Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

Release Time:2024-12-19| Hits:

Institution:国家胶体材料工程技术研究中心

Title of Paper:Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

Journal:Polymers

First Author:刘俊俊

Document Code:1777985786281746433

Volume:16

Issue:6

Number of Words:5

Translation or Not:No

Date of Publication:2024-03

Release Time:2024-12-19

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Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists
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Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

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