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Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure

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Affiliation of Author(s):机械工程学院

Journal:COATINGS

First Author:崔远驰

Document Code:E0737E3F62EF4AC388734E15EC885AF6

Volume:11

Issue:7

Number of Words:5

Translation or Not:no

Date of Publication:2021-07-01

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