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The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2 Formulations

Release Time:2019-10-30 Hits:

Institution:集成电路学院
Journal:ECS J. Solid State Sci. & Tech.
First Author:李波
All the Authors:王卿璞,Li Yuxiang
Document Code:lw-147347
Volume:2
Issue:4
Page Number:73
Number of Words:5
Translation or Not:No
Date of Publication:2013-01

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