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山东大学

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High-dose ion-implanted photoresist stripping in environmentally benign supercritical CO2 nonfluorous surfactant microemulsions

Release Time:2019-10-30 Hits:

Institution:集成电路学院
Journal:Microelectron. Eng.
First Author:韩婷婷
All the Authors:王卿璞,Li Yuxiang
Document Code:lw-136618
Volume:96
Page Number:1
Number of Words:3800
Translation or Not:No
Date of Publication:2012-03

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