山东大学教师主页王素梅 Ti doping enhanced alumina dielectrics for low-voltage thin-film transistors via low-temperature lightwave irradiation Home

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Ti doping enhanced alumina dielectrics for low-voltage thin-film transistors via low-temperature lightwave irradiation

Release Time:2021-05-31 Hits:

Institution:材料科学与工程学院
Journal:Journal of Materials Science: Materials in Electronics
First Author:王素梅
Document Code:DBB6FF101076483281823C168F7CA292
Volume:31
Issue:8
Page Number:5866
Number of Words:5
Translation or Not:No
Date of Publication:2020-04

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Ti doping enhanced alumina dielectrics for low-voltage thin-film transistors via low-temperature lightwave irradiation