山东大学教师主页王素梅 Rapid and facile low-temperature solution production of ZrO2 films as high-k dielectrics for flexible low-voltage thin-film transistors Home

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Rapid and facile low-temperature solution production of ZrO2 films as high-k dielectrics for flexible low-voltage thin-film transistors

Release Time:2021-06-01 Hits:

Institution:材料科学与工程学院
Journal:Ceramics International
First Author:Xia, Guodong
Document Code:273AEA1F82144FE6B5B05EACA12D79C8
Volume:45
Issue:13
Page Number:16482
Number of Words:4
Translation or Not:No
Date of Publication:2019-09

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Rapid and facile low-temperature solution production of ZrO2 films as high-k dielectrics for flexible low-voltage thin-film transistors