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Enhancement of thermoelectric performance in monolayer AlP3 via Ga and In doping: A first-principles study
Affiliation of Author(s):热科学与工程研究中心
Journal:Materials Science in Semiconductor Processing
Document Code:CC77CCB256F34B0F9E6C8A7C49AD2832
Volume:176
Issue:2024
Page Number:108332
Number of Words:7
Translation or Not:no
Date of Publication:2024-07-15