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Schottky-barrier thin-film transistors based on HfO2-capped InSe

Release Time:2019-10-13
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Institution:
微电子学院
Title of Paper:
Schottky-barrier thin-film transistors based on HfO2-capped InSe
Journal:
Applied physics letters
First Author:
辛倩
All the Authors:
Song A M,王一鸣,Shi Yanpeng,Yifei Philip Zhang
Document Code:
7B2AFA27B7F54882ACFDC3B4111227BF
Translation or Not:
No
Date of Publication:
2019-07
Release Time:
2019-10-13