A Novel Thermally Evaporated Etching Mask for Low-Damage Dry Etching
Release Time:2019-10-24
Hits:
- Institution:
- 集成电路学院
- Title of Paper:
- A Novel Thermally Evaporated Etching Mask for Low-Damage Dry Etching
- Journal:
- IEEE Transactions on Nanotechnology
- First Author:
- 王汉斌
- All the Authors:
- 王一鸣,王卿璞,辛倩,韩琳,Song A M
- Document Code:
- E56E2B7ED1104702BAEB516FA27F194D
- Volume:
- 16
- Issue:
- 2
- Page Number:
- 290
- Translation or Not:
- No
- Date of Publication:
- 2017-03
- Release Time:
- 2019-10-24