A Novel Thermally Evaporated Etching Mask for Low-Damage Dry Etching
Release time:2019-10-24
Hits:
- Affiliation of Author(s):
- 集成电路学院
- Journal:
- IEEE Transactions on Nanotechnology
- All the Authors:
- Yiming Wang,wangqingpu,xinqian,hanlin,Song A M
- First Author:
- 王汉斌
- Document Code:
- E56E2B7ED1104702BAEB516FA27F194D
- Volume:
- 16
- Issue:
- 2
- Page Number:
- 290
- Translation or Not:
- no
- Date of Publication:
- 2017-03-01