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Effect of epitaxial growth rate on morphological, structural and optical properties of beta-Ga2O3 films prepared by MOCVD

Release time:2022-06-18|Hits:

Affiliation of Author(s):集成电路学院

Journal:Materials Research Bulletin

First Author:王迪

Document Code:4D4D953CCFCB46E68E85AE80D961AD64

Volume:149

Number of Words:5

Translation or Not:no

Date of Publication:2022-05-01

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Heteroepitaxial growth of the orthorhombic Ta2O5 single-crystalline films on epi-GaN/α-Al2O3 (0001) substrates by MOCVD
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High-quality and single-crystal ZnSnO3 thin films: Fabrication and properties

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