Patents
一种温室气体的相干测量装置
Release Time:2025-09-18
  • Institution:
    新一代半导体材料研究院
  • Type of Patent:
    Invent
  • Application Number:
    202111421377.0
  • Number of Inventors:
    3
  • Service Invention or Not:
    No
  • Application Date:
    2021-11-26
  • Publication Date:
    2023-12-26
  • Authorization Date:
    2023-12-26
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