Effects of Atomic-Layer-Deposition temperature on the properties of Al2O3 insulators and InAlZnO Thin-Film-Transistors with Dual-Active-Layer structure, Applied Surface Science 578, 2022，通讯作者.
发布时间：2024-11-08
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- Effects of Atomic-Layer-Deposition temperature on the properties of Al2O3 insulators and InAlZnO Thin-Film-Transistors with Dual-Active-Layer structure, Applied Surface Science 578, 2022，通讯作者.
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- 发布时间：
- 2024-11-08
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