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Enhanced device performance of GaN high electron mobility transistors with in situ crystalline SiN cap layer
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Affiliation of Author(s): : 新一代半导体材料研究院

Title of Paper: : Enhanced device performance of GaN high electron mobility transistors with in situ crystalline SiN cap layer

Journal: : APPLIED PHYSICS LETTERS

First Author: : 罗鑫

Document Code: : 1843556233512062977

Volume: : 125

Issue: : 12

Number of Words: : 4000

Translation or Not: : no

Date of Publication: : 2024-09-16

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Gender : Male

School/Department : 新一代半导体材料研究院

Date of Employment : 2020-11-15

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