韩吉胜
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Roughness control in the processing of 2-inch polycrystalline diamond films on 4H-SiC wafers
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Affiliation of Author(s): : 新一代半导体材料研究院

Title of Paper: : Roughness control in the processing of 2-inch polycrystalline diamond films on 4H-SiC wafers

Journal: : Materials Science in Semiconductor Processing

First Author: : 胡秀飞

Document Code: : 1833780037035331586

Volume: : 184

Number of Words: : 7

Translation or Not: : no

Date of Publication: : 2024-12-01

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Gender : Male

School/Department : 新一代半导体材料研究院

Date of Employment : 2020-11-15

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