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一种增强型GaN HEMT器件结构和制造方法
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Title: : 一种增强型GaN HEMT器件结构和制造方法

Affilication of Author(s): : 新一代半导体材料研究院

Type of Patent: : 发明

Application Number: : 202410508321.6

Number of Inventors: : 4

Service Invention or Not: : no

Application Date: : 2024-04-26

Publication Date: : 2024-07-09

Authorization Date: : 2024-07-09

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Gender : Male

School/Department : 新一代半导体材料研究院

Date of Employment : 2020-11-15

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