Title: : 一种碳化硅器件双层金属的刻蚀方法
Affilication of Author(s): : 新一代半导体材料研究院
Type of Patent: : 发明
Application Number: : 202311623560.8
Number of Inventors: : 3
Service Invention or Not: : no
Application Date: : 2023-11-30
Publication Date: : 2024-08-02
Authorization Date: : 2024-08-02
Gender : Male
School/Department : 新一代半导体材料研究院
Date of Employment : 2020-11-15
The Last Update Time : ..
