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    Chemical Mechanical Polishing of 4H-SiC with Strong Oxidizing Slurry

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    • Institution:晶体材料研究所

    • Title of Paper:Chemical Mechanical Polishing of 4H-SiC with Strong Oxidizing Slurry

    • Journal:《人工晶体学报》

    • First Author:胡小波

    • All the Authors:陈秀芳,徐现刚

    • Document Code:lw-175592

    • Translation or Not:No

    • Date of Publication:2015-03

    • Release Time:2019-10-24
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