Influence of different GaN cap layer thicknesses on electron mobility in AlN/GaN heterostructure field-effect transistors
Release time:2019-10-24
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- Affiliation of Author(s):
- 集成电路学院
- Journal:
- ？Superlattices and Microstructures
- All the Authors:
- linzhaojun,Cheng Aijie
- First Author:
- cuipeng
- Indexed by:
- 综合研究
- Document Code:
- lw-183661
- Volume:
- 100
- Page Number:
- 358
- Translation or Not:
- no
- Date of Publication:
- 2016-09-29
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