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Study of Gate Width Influence on Extrinsic Transconductance in AlGaN/GaN Heterostructure Field-Effect Transistors With Polarization Coulomb Field Scattering

Release Time:2019-10-24
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Institution:
集成电路学院
Title of Paper:
Study of Gate Width Influence on Extrinsic Transconductance in AlGaN/GaN Heterostructure Field-Effect Transistors With Polarization Coulomb Field Scattering
Journal:
IEEE Transactions on Electron Devices
First Author:
杨铭
All the Authors:
林兆军
Document Code:
lw-183660
Volume:
63
Issue:
10
Page Number:
3908
Translation or Not:
No
Date of Publication:
2016-08
Release Time:
2019-10-24