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Influence of the gate position on source-to-drain resistance in AlGaN/AlN/GaN heterostructure field-effect transistors

Release time:2019-10-24
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Affiliation of Author(s):
集成电路学院
Journal:
AIP Advances
All the Authors:
linzhaojun
First Author:
刘艳
Indexed by:
综合研究
Document Code:
36506759656F43E3BA7CC3D569527990
Volume:
7
Issue:
8
Translation or Not:
no
Date of Publication:
2017-08-01