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Etching SiO2 with HF/pyridine-supercritical carbon dioxide solutions and resultant interfacial electronic properties

Release Time:2019-10-24
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Institution:
微电子学院
Title of Paper:
Etching SiO2 with HF/pyridine-supercritical carbon dioxide solutions and resultant interfacial electronic properties
Journal:
J. Vac. Sci. Technol., B
First Author:
Li Yuxiang
All the Authors:
Li Yuxiang
Document Code:
lw-102450
Volume:
25
Issue:
4
Page Number:
1139
Translation or Not:
No
Date of Publication:
2007-06
Release Time:
2019-10-24