High-dose ion-implanted photoresist stripping in environmentally benign supercritical CO2 nonfluorous surfactant microemulsions
Release Time:2019-10-30
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- Institution:
- 微电子学院
- Title of Paper:
- High-dose ion-implanted photoresist stripping in environmentally benign supercritical CO2 nonfluorous surfactant microemulsions
- Journal:
- Microelectron. Eng.
- First Author:
- 韩婷婷
- All the Authors:
- 王卿璞,Li Yuxiang
- Indexed by:
- Applied Research
- Document Code:
- lw-136618
- Volume:
- 96
- Page Number:
- 1
- Translation or Not:
- No
- Date of Publication:
- 2012-03
- Release Time:
- 2019-10-30