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High-dose ion-implanted photoresist stripping in environmentally benign supercritical CO2 nonfluorous surfactant microemulsions

Release time:2019-10-30
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Affiliation of Author(s):
微电子学院
Journal:
Microelectron. Eng.
All the Authors:
wangqingpu,Li Yuxiang
First Author:
韩婷婷
Indexed by:
Applied Research
Document Code:
lw-136618
Volume:
96
Page Number:
1
Translation or Not:
no
Date of Publication:
2012-03-20