The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2 Formulations
Release Time:2019-10-30
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- Institution:
- 微电子学院
- Title of Paper:
- The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2 Formulations
- Journal:
- ECS J. Solid State Sci. & Tech.
- First Author:
- 李波
- All the Authors:
- 王卿璞,Li Yuxiang
- Indexed by:
- Applied Research
- Document Code:
- lw-147347
- Volume:
- 2
- Issue:
- 4
- Page Number:
- 73
- Translation or Not:
- No
- Date of Publication:
- 2013-01
- Release Time:
- 2019-10-30