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The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2 Formulations

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Affiliation of Author(s):微电子学院

Journal:ECS J. Solid State Sci. & Tech.

All the Authors:wangqingpu,Li Yuxiang

First Author:李波

Indexed by:Applied Research

Document Code:lw-147347

Volume:2

Issue:4

Page Number:73

Translation or Not:no

Date of Publication:2013-01-29

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