The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2 Formulations
Release time:2019-10-30
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- Affiliation of Author(s):
- 微电子学院
- Journal:
- ECS J. Solid State Sci. & Tech.
- All the Authors:
- wangqingpu,Li Yuxiang
- First Author:
- 李波
- Indexed by:
- Applied Research
- Document Code:
- lw-147347
- Volume:
- 2
- Issue:
- 4
- Page Number:
- 73
- Translation or Not:
- no
- Date of Publication:
- 2013-01-29