The effects of supercritical CO2 formulations on the removal of high-dose ion-implanted photoresists
Release Time:2019-10-30
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- Institution:
- 微电子学院
- Title of Paper:
- The effects of supercritical CO2 formulations on the removal of high-dose ion-implanted photoresists
- Journal:
- Microelectron. Eng.
- First Author:
- 李波
- All the Authors:
- 王卿璞,Li Yuxiang
- Indexed by:
- Applied Research
- Document Code:
- lw-147346
- Volume:
- 108
- Page Number:
- 50
- Translation or Not:
- No
- Date of Publication:
- 2013-04
- Release Time:
- 2019-10-30