The effects of supercritical CO2 formulations on the removal of high-dose ion-implanted photoresists
Release time:2019-10-30
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- Affiliation of Author(s):
- 微电子学院
- Journal:
- Microelectron. Eng.
- All the Authors:
- wangqingpu,Li Yuxiang
- First Author:
- 李波
- Indexed by:
- Applied Research
- Document Code:
- lw-147346
- Volume:
- 108
- Page Number:
- 50
- Translation or Not:
- no
- Date of Publication:
- 2013-04-06