Title : Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD

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Affiliation of Author(s):微电子学院

Title of Paper:Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD

Journal:Journal of Materials Science: Materials in Electronics

All the Authors:luancaina

First Author:马瑾

Indexed by:Unit Twenty Basic Research

Document Code:lw-178176

Translation or Not:no

Date of Publication:2016-01-08