Title : Preparation and characterization of Ga2xIn2(1-x)O3 films deposited on ZrO2 (100) substrates by MOCVD

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Affiliation of Author(s):物理学院

Title of Paper:Preparation and characterization of Ga2xIn2(1-x)O3 films deposited on ZrO2 (100) substrates by MOCVD

Journal:JOURNAL OF ALLOYS AND COMPOUNDS

All the Authors:Ma Jin

First Author:马瑾

Document Code:lw-98267

Volume:499

Issue:1

Page Number:75

Number of Words:2300

Translation or Not:no

Date of Publication:2010-06-04