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一种透明的双层结构忆阻器及其制备方法

Release Time:2021-06-09
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Title:
一种透明的双层结构忆阻器及其制备方法
Institution:
集成电路学院
Type of Patent:
Invent
Application Number:
202110512729.7
Number of Inventors:
1
Service Invention or Not:
No
Application Date:
2021-05-11
Publication Date:
2022-09-16
Authorization Date:
2022-09-16
Release Time:
2021-06-09