一种透明的双层结构忆阻器及其制备方法

Release time:2021-06-09|Hits:

Affilication of Author(s):微电子学院

Type of Patent:发明

Application Number:202110512729.7

Number of Inventors:1

Service Invention or Not:no

Application Date:2021-05-11

Publication Date:2022-09-16

Authorization Date:2022-09-16