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一种透明的双层结构忆阻器及其制备方法

Release time:2021-06-09
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Affilication of Author(s):
微电子学院
Type of Patent:
发明
Application Number:
202110512729.7
Number of Inventors:
1
Service Invention or Not:
no
Application Date:
2021-05-11
Publication Date:
2022-09-16
Authorization Date:
2022-09-16