A Novel Thermally Evaporated Etching Mask for Low-Damage Dry Etching
Release time:2019-06-12
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- Affiliation of Author(s):
- 微电子学院
- Journal:
- IEEE Transactions on Nanotechnology
- All the Authors:
- Yiming Wang,wangqingpu,xinqian,hanlin,Song A M
- First Author:
- 王汉斌
- Indexed by:
- Unit Twenty Basic Research
- Document Code:
- E56E2B7ED1104702BAEB516FA27F194D
- Volume:
- 16
- Issue:
- 2
- Page Number:
- 290
- Translation or Not:
- no
- Date of Publication:
- 2017-03-01