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Experimental investigations on ferroelectric dielectric breakdown in sub-10 nm Hf0.5Zr0.5O2 film through comprehensive TDDB characterization

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  • Affiliation of Author(s):信息科学与工程学院

  • Journal:JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS

  • First Author:李晓鹏

  • Document Code:B09FE56FB1A94844B9751E200056453F

  • Volume:61

  • Issue:10

  • Number of Words:3

  • Translation or Not:no

  • Date of Publication:2022-10-01

  • Date of Publication:2022-10-01
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