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    Comprehensive Analysis of Oxidant Effects During ALD Process of Hf0.5Zr0.5O2 Ferroelectric Thin Films

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    • Institution:信息科学与工程学院

    • Title of Paper:Comprehensive Analysis of Oxidant Effects During ALD Process of Hf0.5Zr0.5O2 Ferroelectric Thin Films

    • Journal:IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY

    • First Author:李晓鹏

    • Document Code:1934548234689994754

    • Number of Words:3

    • Translation or Not:No

    • Date of Publication:2025-01

    • Release Time:2025-10-02
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