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Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device
Affiliation of Author(s):微电子学院
Journal:JOURNAL OF ALLOYS AND COMPOUNDS Journal
All the Authors:xinqian,Li Yuxiang,Song A M
First Author:马鹏飞
Indexed by:Unit Twenty Basic Research
Document Code:493ECA4D2F7E4A1A8A8F23A9ED815A53
Volume:792
Page Number:543
Translation or Not:no
Date of Publication:2019-07-05