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辛倩

Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates


Gender:Female
Alma Mater:山东大学
Education Level:With Certificate of Graduation for Doctorate Study
Degree:Doctor
Status:Employed
School/Department:集成电路学院
Date of Employment:2012-09-14
College: School of Integrated Circuits,Shandong University
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Current position: Home >> Scientific Research >> Paper Publications
Post-annealing effect of low temperature atomic layer deposited Al2O3 on the top gate IGZO TFT

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Institution:集成电路学院

Title of Paper:Post-annealing effect of low temperature atomic layer deposited Al2O3 on the top gate IGZO TFT

Journal:NANOTECHNOLOGY

First Author:郑帅英

Document Code:DFB94002A24C4981A267B49A56B9EC7A

Volume:35

Issue:0

Page Number:155203

Number of Words:7

Translation or Not:No

Date of Publication:2024-04

Release Time:2024-05-22