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一种单晶硅微纳双尺度减反射绒面及其制备方法

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Affilication of Author(s):机械工程学院

Type of Patent:发明

Application Number:202210697039.8

Number of Inventors:7

Service Invention or Not:no

Application Date:2022-06-20

Publication Date:2023-11-21

Authorization Date:2023-11-21

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