Paper Publications

Efficient access to non-damaging GaN (0001) by inductively coupled plasma etching and chemical–mechanical polishing

Release Time:2024-09-23| Hits:

Institution:新一代半导体材料研究院

Title of Paper:Efficient access to non-damaging GaN (0001) by inductively coupled plasma etching and chemical–mechanical polishing

Journal:Applied Surface Science

First Author:李秋波

Document Code:EEA4EE88010C49A4A376ADBC15C1CB6F

Issue:679

Number of Words:9

Translation or Not:No

Date of Publication:2024-09

Release Time:2024-09-23