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Paper Publications
Inductively coupled plasma etching of silicon carbide: a review
Release Time:2025-12-31| Hits:
Institution:新一代半导体材料研究院
Title of Paper:Inductively coupled plasma etching of silicon carbide: a review
Journal:Journal of Materials Science: Materials in Electronics
First Author:苑登文
All the Authors:徐现刚,韩吉胜
Document Code:6BAF60ED38044EE2BD4AB079E0801583
Issue:36
Page Number:2264
Translation or Not:No
Date of Publication:2025-12
Release Time:2025-12-31
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