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Handoko LINEWIH


Gender:Male
School/Department:新一代半导体材料研究院
Date of Employment:2023-02
College: Institute of Novel Semiconductors
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一种外延层非均匀分布的碳化硅SBD器件及其制作方法

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Title:一种外延层非均匀分布的碳化硅SBD器件及其制作方法

Institution:新一代半导体材料研究院

Type of Patent:Invent

Application Number:202410584864.6

Number of Inventors:4

Service Invention or Not:No

Application Date:2024-05-13

Publication Date:2024-08-06

Authorization Date:2024-08-06

Release Time:2024-10-16

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