中文

Threading dislocation classification for 4H-SiC substrates using the KOH etching method

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  • Institution:新一代半导体材料研究院

  • Title of Paper:Threading dislocation classification for 4H-SiC substrates using the KOH etching method

  • Journal:CrystEngComm

  • First Author:崔潆心

  • Document Code:211BA6B55A17470D85B2CA4D878772A1

  • Issue:7

  • Page Number:978

  • Number of Words:2

  • Translation or Not:No

  • Date of Publication:2018-02

  • Release Time:2025-05-24

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