A method to determine the strain of the AlGaN barrier layer under the gate in AlGaN/AlN/GaN heterostructure field-effect transistors
Release time:2019-04-14
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- Affiliation of Author(s):
- 微电子学院
- Journal:
- Superlattices and Microstructures,
- Indexed by:
- 综合研究
- Document Code:
- lw-173260
- Volume:
- 79
- Translation or Not:
- no
- Date of Publication:
- 2014-12-23