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The influence of the channel electric field distribution on the polarization Coulomb field scattering in AlN/GaN heterostructure field-effect transistors

Release Time:2019-10-24
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Institution:
集成电路学院
Title of Paper:
The influence of the channel electric field distribution on the polarization Coulomb field scattering in AlN/GaN heterostructure field-effect transistors
Journal:
Journal of Semiconductors
First Author:
于英霞
All the Authors:
林兆军
Document Code:
lw-164576
Volume:
35
Issue:
12
Page Number:
124007
Number of Words:
3
Translation or Not:
No
Date of Publication:
2014-07
Release Time:
2019-10-24