A novel AlGaN/GaN heterostructure field-effect transistor based on open-gate technology
发布时间:2021-12-09
点击次数:
- 所属单位:
- 集成电路学院
- 论文名称:
- A novel AlGaN/GaN heterostructure field-effect transistor based on open-gate technology
- 发表刊物:
- Scientific Reports
- 第一作者:
- 刘阳
- 论文编号:
- 9E5379E96DF4444ABA017B4CD9E0DCD7
- 卷号:
- 11
- 期号:
- 1
- 是否译文:
- 否
- 发表时间:
- 2021-11
- 发布时间:
- 2021-12-09
- 上一条:The influence of polarization Coulomb field scattering on the parasitic source resistance of E-mode P-GaN/AlGaN/GaN heterostructure field-effect transistors
- 下一条:The relationship between AlGaN barrier layer thickness and polarization Coulomb field scattering in AlGaN/GaN heterostructure field-effect transistors

