Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device
Release Time:2019-06-06
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- Institution:
- 微电子学院
- Title of Paper:
- Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device
- Journal:
- JOURNAL OF ALLOYS AND COMPOUNDS Journal
- First Author:
- Pengfei Ma
- Correspondence Author:
- Yuxiang Li,Aimin Song
- All the Authors:
- Jiamin Sun,Guanqun Zhang,Guangda Liang,Qian Xin
- Indexed by:
- Unit Twenty Basic Research
- Document Code:
- 493ECA4D2F7E4A1A8A8F23A9ED815A53
- Volume:
- 792
- Page Number:
- 543
- Translation or Not:
- No
- Date of Publication:
- 2019-07
- Release Time:
- 2019-06-06