中文

Revelation of the dislocations in the C face of 4HSiC substrates using a microwave plasma etching treatment

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  • Affiliation of Author(s):新一代半导体材料研究院

  • Journal:CRYSTENGCOMM

  • First Author:彭燕

  • Document Code:FE028CCECC824D29AC9F02E107A1EB6E

  • Issue:23

  • Page Number:353

  • Number of Words:3000

  • Translation or Not:no

  • Date of Publication:2020-10-12

  • Date of Publication:2020-10-12

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