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Significant Reliability Improvement by Inducing Dual Atomic-Thin Titanium Intercalation Layers in Hf0.5Zr0.5O2 Films

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Affiliation of Author(s):信息科学与工程学院
Journal:IEEE Electron Device Letters
First Author:台路
Document Code:CF164AC117BB45CE8FAA0F82BEDC4AE4
Volume:44
Issue:5
Page Number:753
Number of Words:3000
Translation or Not:no
Date of Publication:2023-05-01
Date of Publication:2023-05-01

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Significant Reliability Improvement by Inducing Dual Atomic-Thin Titanium Intercalation Layers in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Films