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Significant Reliability Improvement by Inducing Dual Atomic-Thin Titanium Intercalation Layers in Hf 0.5 Zr 0.5 O 2 Films

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  • Affiliation of Author(s):信息科学与工程学院

  • Journal:IEEE Electron Device Letters

  • First Author:台路

  • Document Code:070A75DB4BDD4252BB1C14460AEFBD1C

  • Issue:44（5）

  • Page Number:1

  • Number of Words:3

  • Translation or Not:no

  • Date of Publication:2023-05-01

  • Date of Publication:2023-05-01
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