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Toward Low-Thermal-Budget Processing in Ferroelectric Hf0.5Zr0.5O2 Thin Films by Ozone Interface Oxidation

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  • Affiliation of Author(s):信息科学与工程学院

  • Journal:IEEE Electron Device Letters

  • First Author:台路

  • Document Code:1737382290592821250

  • Volume:44

  • Issue:12

  • Page Number:1959-1962

  • Number of Words:3

  • Translation or Not:no

  • Date of Publication:2023-12-01

  • Date of Publication:2023-12-01
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