vrtGzJnJtqLNSnfdKnXMvkgCUPZmVkANPXQucfgSlysC0YkvWx1zKe3ERQEw
Current position: Home >> Scientific Research >> Patents

Conductivity-based selective etching and its applications for GaN Device,s(日本授权发明专利)授权号:JP5961557B2 第一发明人

Hits:

Title:Conductivity-based selective etching and its applications for GaN Device,s(日本授权发明专利)授权号:JP5961557B2 第一发明人

Service Invention or Not:No

Release Time:2022-11-10

Prev One:based on selective etching of the conductive for GaN Devices and their applications 授权号: CN102782818B 第一发明人

Next One:Conductivity based selective etch for GaN Devices and applications thereof(国授权发明专利)授权号:US9206524B2 第一发明人