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Significant Reliability Improvement by Inducing Dual Atomic-Thin Titanium Intercalation Layers in Hf 0.5 Zr 0.5 O 2 Films
Affiliation of Author(s):信息科学与工程学院
Journal:IEEE Electron Device Letters
First Author:台路
Document Code:A4E9F2F06382452495F07AEBDCCA061C
Issue:44(5)
Number of Words:3
Translation or Not:no
Date of Publication:2023-05-01