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Toward Low-Thermal-Budget Processing in Ferroelectric Hf0.5Zr0.5O2 Thin Films by Ozone Interface Oxidation
Affiliation of Author(s):信息科学与工程学院
Journal:IEEE Electron Device Letters
First Author:台路
Document Code:1737382290592821250
Volume:44
Issue:12
Page Number:1959-1962
Number of Words:3
Translation or Not:no
Date of Publication:2023-12-01