Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates
The Last Update Time: ..
Hits:
Institution:信息科学与工程学院
Title of Paper:Mechanisms for enhanced ferroelectric properties in ultra-thin Hf0.5Zr0.5O2 film under low-temperature, long-term annealing
Journal:APPLIED PHYSICS LETTERS
Document Code:1833778494273851394
Volume:125
Issue:9
Number of Words:3
Translation or Not:No
Date of Publication:2024-08
Release Time:2025-10-02
Prev One:Imprint-Correlated Retention Loss in Hf0.5Zr0.5O2 Ferroelectric Thin Film Through Wide-Temperature Characterizations
Next One:Silicon Atomic-Layer Doped Hf $_{\text{0.7}}$ Zr $_{\text{0.3}}$ O $_{\text{2}}$ Films: Toward Low Coercive Field (0.64 MV/cm) and High Endurance ( ${>}\text{10}^{\text{12}}$ Cycles)
Current position: